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ASTM International , 05/01/2016
Publisher: ASTM
File Format: PDF
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1.1This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2This standard sets purity grade levels, physical attributes, analytical methods, and packaging.
1.2.1The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
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